Remote plasma-enhanced CVD of fluorinated silicon nitride films

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作者：
Alexandrov, Sergei E. [1 ]
Hitchman, Michael L. [1 ]
机构：
[1] St Petersburg State Technical Univ, St. Petersburg, Russia
来源：
Advanced Materials | 1997年 / 9卷 / 07期
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页码：111 / 117
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