Deposition of silicon nitride by low-pressure electron cyclotron resonance plasma enhanced chemical vapor deposition in N2/Ar/SiH4

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Moshkalyov, S.A.
Diniz, J.A.
Swart, J.W.
Tatsch, P.J.
Machida, M.
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1997年 / 15卷 / 06期
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