Transparent conducting Sn-doped indium oxide (ITO) films have been prepared on polyimide (PI) thin film substrate at low substrate temperature by reactive evaporation. The structural, optical and electrical properties of the deposited films have been investigated. High quality films with resistivity as low as 7×10-4 Ω·cm and transmittance over 80% have been obtained. The temperature dependence of mobility and carrier concentration have been measured over a temperature range 10-400 K. Corresponding scattering mechanism of charge carriers in the films have been discussed.
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Indian Inst Technol, Dept Phys, Semicond Phys Lab, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Phys, Semicond Phys Lab, Madras 600036, Tamil Nadu, India
Subrahmanyam, A.
Barik, Ullash Kumar
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Indian Inst Technol, Dept Phys, Semicond Phys Lab, Madras 600036, Tamil Nadu, IndiaIndian Inst Technol, Dept Phys, Semicond Phys Lab, Madras 600036, Tamil Nadu, India
机构:
Key Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education
School of Material Science and Engineering, Habei University of TechnologyKey Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education
Li L.-N.
Xue J.-M.
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Key Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of EducationKey Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education
Xue J.-M.
Zhao Y.
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Key Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of EducationKey Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education
Zhao Y.
Li Y.-X.
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School of Material Science and Engineering, Habei University of TechnologyKey Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education
Li Y.-X.
Geng X.-H.
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Key Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of EducationKey Laboratory of Optoelectronic Thin Film Devices and Technique of Tianjin, Nankai University, Chinese Ministry of Education