PREPARATION OF III-V COMPOUNDS BY REDUCTION OF PRECURSORS.

被引:0
|
作者
Gallagher, P.K. [1 ]
Robbins, M. [1 ]
Schrey, F. [1 ]
Lambrecht Jr., V.G. [1 ]
Chin, G.Y. [1 ]
机构
[1] AT&T Bell Lab, Murray Hill, NJ,, USA, AT&T Bell Lab, Murray Hill, NJ, USA
关键词
INORGANIC COMPOUNDS - Reduction - SEMICONDUCTING GALLIUM ARSENIDE - SEMICONDUCTING GALLIUM COMPOUNDS - SEMICONDUCTING INDIUM COMPOUNDS;
D O I
10.1016/0167-577X(83)90025-3
中图分类号
学科分类号
摘要
Compound semiconductors are important in a wide variety of optoelectronic and microwave devices. Stoichiometric polycrystalline InP, GaAs and (InGa)As were prepared by hydrogen reduction of phosphate and arsenate precursors precipitated from aqueous solution. These ill-defined phosphate and arsenate precipitates were dried and heated at elevated temperatures in a stream of pure hydrogen to produce the phosphides and arsenides. It was found necessary to introduce elemental phosphorus or arsenic in a heated region upstream of the reaction to establish the necessary pressure of P or As in the H//2 stream to inhibit the dissociation of the newly formed InP or GaAs.
引用
收藏
页码:27 / 30
相关论文
共 50 条
  • [31] MECHANISM OF THE TRANSFORMATION OF ORGANOMETALLIC PRECURSORS INTO III-V SEMICONDUCTORS
    THEOPOLD, KH
    DOUGLAS, T
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 198 : 363 - INOR
  • [32] ORGANOMETALLIC PRECURSORS FOR SOLUBLE III-V SEMICONDUCTOR CLUSTERS
    THEOPOLD, KH
    DOUGLAS, T
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1991, 202 : 313 - INOR
  • [33] ALTERNATIVE PRECURSORS FOR III-V MOVPE CRITERIA FOR EVALUATION
    BRAUERS, A
    JOURNAL OF CRYSTAL GROWTH, 1991, 107 (1-4) : 281 - 289
  • [34] STUDIES OF THE SURFACE REACTIVITY OF NOVEL HYDRIDE ADDUCT PRECURSORS FOR CBE GROWTH OF III-V COMPOUNDS
    FOORD, JS
    MURRELL, AJ
    OHARE, D
    SINGH, NK
    WEE, ATS
    WHITAKER, TJ
    JOURNAL OF CRYSTAL GROWTH, 1991, 107 (1-4) : 1040 - 1040
  • [35] III-V compounds for solar cell applications
    A.W. Bett
    F. Dimroth
    G. Stollwerck
    O.V. Sulima
    Applied Physics A, 1999, 69 : 119 - 129
  • [36] ATOMIC LAYER MANIPULATION OF III-V COMPOUNDS
    AOYAGI, Y
    SHINMURA, K
    KAWASAKI, K
    NAKAMOTO, I
    GAMO, K
    NAMBA, S
    THIN SOLID FILMS, 1993, 225 (1-2) : 120 - 123
  • [37] DISTRIBUTION OF ATOMS IN MIXED III-V COMPOUNDS
    SELA, I
    GRIDIN, VV
    BESERMAN, R
    SARFATY, R
    FEKETE, D
    MORKOC, H
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (03) : 966 - 968
  • [38] PLASMA-ETCHING OF III-V COMPOUNDS
    FLAMM, DL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C96 - C96
  • [39] VALENCE BAND STRUCTURE OF III-V COMPOUNDS
    BRAUNSTEIN, R
    KANE, EO
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1962, 23 (OCT) : 1423 - &
  • [40] POLAR MOBILITY OF HOLES IN III-V COMPOUNDS
    WILEY, JD
    PHYSICAL REVIEW B, 1971, 4 (08): : 2485 - &