METHODS OF ELECTRON-BEAM THERMOMAGNETIC WRITING.

被引：0
|
作者：
Glushenko, V.N.
Derenovskii, M.V.
Lysak, V.V.
机构：
来源：
| 1600年
关键词：
CHROMIUM DIOXIDE - RECORDING HEADS - THERMOMAGNETIC WRITING;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Computer-generated hologram fabricated by electron-beam direct writing
    Gao, Feng
    Zhu, Jian-Hua
    Huang, Qi-Zhong
    Gao, Fu-Hua
    Yao, Jun
    Guo, Yong-Kang
    Cui, Zheng
    Zhongguo Jiguang/Chinese Journal of Lasers, 2001, 28 (06): : 556 - 558
  • [42] STITCHING WITH OVERLAY IN DIRECT WAFER WRITING USING SCANNING ELECTRON-BEAM
    WILSON, AD
    KERN, A
    KIRK, J
    DOOLY, C
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C104 - C104
  • [43] Process monitoring of electron-beam based writing of semiconductor mask patterns
    Helm, Kevin
    Dietze, Sebastian
    Eynon, Benjamin
    Djurdjanovic, Dragan
    CIRP ANNALS-MANUFACTURING TECHNOLOGY, 2022, 71 (01) : 413 - 416
  • [44] Electron-Beam Writing of Atomic-Scale Reconstructions at Oxide Interfaces
    Segantini, Greta
    Hsu, Chih-Ying
    Rischau, Carl Willem
    Blah, Patrick
    Matthiesen, Mattias
    Gariglio, Stefano
    Triscone, Jean-Marc
    Alexander, Duncan T. L.
    Caviglia, Andrea D.
    NANO LETTERS, 2024, 24 (45) : 14191 - 14197
  • [45] GAAS MMIC FABRICATION USING AN ELECTRON-BEAM DIRECT WRITING SYSTEM
    TSUKAO, T
    MATSUMOTO, N
    NAKAGAWA, Y
    HUKUYAMA, K
    YOSHIMASU, T
    SAKUNO, K
    ISOBE, M
    YAMADA, A
    SHARP TECHNICAL JOURNAL, 1992, (53): : 55 - 58
  • [46] DIRECT ELECTRON-BEAM WRITING OF GALLIUM OXIDE ON GAAS (111) AS SURFACES
    ALONSO, M
    SACEDON, JL
    SORIA, F
    APPLIED PHYSICS LETTERS, 1984, 45 (02) : 154 - 156
  • [47] REVERSIBLE ELECTRON-BEAM WRITING ON A SUBMICRON SCALE IN A SUPERIONIC AMORPHOUS FILM
    OLDALE, JM
    ELLIOTT, SR
    APPLIED PHYSICS LETTERS, 1993, 63 (13) : 1801 - 1803
  • [48] RESIST TECHNOLOGY FOR THE METALLIZATION OF INTEGRATED-CIRCUITS BY ELECTRON-BEAM WRITING
    HIEKE, E
    SIEMENS FORSCHUNGS-UND ENTWICKLUNGSBERICHTE-SIEMENS RESEARCH AND DEVELOPMENT REPORTS, 1982, 11 (04): : 174 - 179
  • [49] Evaluation of fine pattern definition with electron-beam direct writing lithography
    Chiou, TB
    Hahmann, P
    Liaw, MC
    Huang, TY
    Sze, SM
    EMERGING LITHOGRAPHIC TECHNOLOGIES IV, 2000, 3997 : 646 - 657
  • [50] POWER-DENSITY OF ELECTRON-BEAM IN BEAM HOLE OF ELECTRON-BEAM WELDING
    IRIE, H
    HASHIMOTO, T
    INAGAKI, M
    ARATA, Y
    TRANSACTIONS OF NATIONAL RESEARCH INSTITUTE FOR METALS, 1981, 23 (04): : 258 - 264
12345