High rate deposition of microcrystalline silicon thin films by VHF-PECVD

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作者
Zhao, Zhi-Wen [1 ,2 ]
Liu, Yu-Ling [1 ]
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[1] School of Information Engineering, Hebei University of Technology, Tianjin 300130, China
[2] School of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, China
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页码:722 / 724
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