Effects of oxidational annealing on properties of VO2 thin films

被引：0
|
作者：
Xu, Kai [1 ,2 ]
Lu, Yuan [1 ,2 ]
Ling, Yongshun [1 ,2 ]
Qiao, Ya [1 ,2 ]
机构：
[1] Infrared Research Institution, Electronic Engineering Institute, Hefei,230037, China
[2] Infrared and Low Temperature Plasma Key Laboratory of Anhui Province, Hefei,230037, China
来源：
Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering | 2015年 / 44卷 / 12期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Magnetron sputtering - Film preparation - Vanadium dioxide - Fourier transform infrared spectroscopy - Crystal orientation - Titanium dioxide - Annealing - Oxide minerals - Film growth
引用
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页码：3723 / 3728
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