Reactive ion etching of β-FeSi2 with inductively coupled plasma

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作者：
Wakayama, Takayuki [1 ]
Suemasu, Takashi [2 ]
Kanazawa, Tomomi [1 ]
Akinaga, Hiroyuki [1 ]
机构：
[1] Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568, Japan
[2] Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2006年 / 45卷 / 20-23期
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