Plasma modeling for ultrashort pulse laser ablation of dielectrics

被引：0
|
作者：
Jiang, L. [1 ]
Tsai, H.L. [1 ]
机构：
[1] Laser-Based Manufacturing Laboratory, Department of Mechanical and Aerospace Engineering, University of Missouri-Rolla, Rolla, MO 65409
来源：
Journal of Applied Physics | 2006年 / 100卷 / 02期
关键词：
In ultrashort pulse (< 10 ps) laser ablation of dielectrics; affected materials are first transformed into absorbing plasma with metallic properties and; then; the subsequent laser-plasma interaction causes material removals. For ultrashort-pulse laser ablation of dielectrics; this study proposes a model using the Fokker-Planck equation for electron density distribution; a plasma model for the optical properties of ionized dielectrics; and quantum treatments for electron heating and relaxation time. The free electron density distribution of the plasma within the pulse duration is then used to determine the ablation crater shape. The predicted threshold fluences and ablation depths for barium aluminum borosilicate and fused silica are in agreement with published experimental data. It is found that the significantly varying optical properties in time and space are the key factors determining the ablation crater shape. The effects of fluence and pulse duration are also studied. © 2006 American Institute of Physics;
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