Self-assembling formation of Ni nanodots on SiO2 induced by remote H2 plasma treatment and their electrical charging characteristics

被引：0
|
作者：
Makihara, Katsunori [1 ]
Shimanoe, Kazuhiro [1 ]
Ikeda, Mitsuhisa [1 ]
Higashi, Seiichiro [1 ]
Miyazaki, Seiichi [1 ]
机构：
[1] Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
来源：
Japanese Journal of Applied Physics | 2008年 / 47卷 / 4 PART 2期
关键词：
7;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Journal article (JA)
引用
收藏
页码：3099 / 3102
相关论文
共 50 条
  • [31] H2 AND O2 ADSORPTIONS ON NI-CU ALLOYS ON SIO2 STUDIED BY MEASUREMENT OF SATURATED MAGNETIZATION
    DALMON, JA
    MARTIN, GA
    IMELIK, B
    SURFACE SCIENCE, 1974, 41 (02) : 587 - 590
  • [32] SELF-BIASING EFFECTS ON PLASMA-ETCHING CHARACTERISTICS OF SI AND SIO2
    COOKE, MJ
    PELLETIER, J
    APPLIED PHYSICS LETTERS, 1988, 53 (01) : 19 - 21
  • [33] THERMODESORPTION OF H2 FROM THE NI/SIO2 CATALYST KT-6500 AFTER REACTIVATION AT VARIOUS TEMPERATURES
    BLAGOVESCENSKAJA, JN
    BABENKOVA, LV
    KINZA, H
    POPOVA, NM
    ZEITSCHRIFT FUR PHYSIKALISCHE CHEMIE-LEIPZIG, 1984, 265 (04): : 697 - 711
  • [34] The evolution of microstructure and surface bonding in SiO2 aerogel film after plasma treatment using O2, N2, and H2 gases
    Kim, JJ
    Park, HH
    Hyun, SH
    THIN SOLID FILMS, 2001, 384 (02) : 236 - 242
  • [35] ELIMINATION OF THE WATER GAS SHIFT REACTION BY DIRECT PROCESSING OF CO/H2/H2O OVER NI/SIO2 CATALYSTS
    KUIJPERS, EGM
    TJEPKEMA, RB
    GEUS, JW
    JOURNAL OF MOLECULAR CATALYSIS, 1984, 25 (1-3): : 241 - 251
  • [36] Novel CaO-SiO2 Sorbent and Bifunctional Ni/Co-CaO/SiO2 Complex for Selective H2 Synthesis from Cellulose
    Zhao, Ming
    Yang, Xiaoshuang
    Church, Tamara L.
    Harris, Andrew T.
    ENVIRONMENTAL SCIENCE & TECHNOLOGY, 2012, 46 (05) : 2976 - 2983
  • [37] Effect of the oxidation process on SiO2/4H-SiC interface electrical characteristics
    Palmieri, R.
    Boudinov, H.
    Radtke, C.
    da Silva, E. F., Jr.
    APPLIED SURFACE SCIENCE, 2008, 255 (03) : 706 - 708
  • [38] SiO2/Si stack's damage in plasma processing: Ar, O2, and H2 gas species effect on damage formation, structure, and recovery
    Nunomura, Shota
    Tsutsumi, Takayoshi
    Kamataki, Kunihiro
    Oshima, Ryuji
    Shiratani, Masaharu
    Hori, Masaru
    SURFACES AND INTERFACES, 2025, 62
  • [39] Controlling factors in the direct formation of H2O2 from H2 and O2 over a Pd/SiO2 catalyst in ethanol
    Liu, Qingsheng
    Lunsford, Jack H.
    APPLIED CATALYSIS A-GENERAL, 2006, 314 (01) : 94 - 100
  • [40] Effect of post oxidation annealing on electrical characteristics of Ni/SiO2/4H-SiC capacitor with varying oxide thickness
    Gupta, Sanjeev K.
    Azam, A.
    Akhtar, J.
    SEMICONDUCTORS, 2012, 46 (04) : 545 - 551
12345