Self-assembling formation of Ni nanodots on SiO2 induced by remote H2 plasma treatment and their electrical charging characteristics

被引：0
|
作者：
Makihara, Katsunori [1 ]
Shimanoe, Kazuhiro [1 ]
Ikeda, Mitsuhisa [1 ]
Higashi, Seiichiro [1 ]
Miyazaki, Seiichi [1 ]
机构：
[1] Graduate School of Advanced Sciences of Matter, Hiroshima University, 1-3-1 Kagamiyama, Higashihiroshima, Hiroshima 739-8530, Japan
来源：
Japanese Journal of Applied Physics | 2008年 / 47卷 / 4 PART 2期
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摘要：
Journal article (JA)
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页码：3099 / 3102
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