Improving the edge profiles of lithography patterns using gray-tone technique in digital photolithography

被引：0
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作者：
Guo, Xiao-Wei
Du, Jing-Lei
Chen, Ming-Yong
Ma, Yan-Qin
Du, Chun-Lei
机构：
[1] Institute of Information Optics, Sichuan University, Chengdu 610064, China
[2] Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
来源：
Guangdian Gongcheng/Opto-Electronic Engineering | 2006年 / 33卷 / 11期
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页码：31 / 35
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