Silicon crystal nanowires produced by metal-induced lateral crystallization

被引:0
|
作者
Nakagawa, Gou [1 ]
Asano, Tanemasa [1 ]
机构
[1] Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan
关键词
D O I
10.1143/jjap.48.06fe03
中图分类号
学科分类号
摘要
引用
收藏
页码:031 / 06
相关论文
共 50 条
  • [1] Silicon Crystal Nanowires Produced by Metal-Induced Lateral Crystallization
    Nakagawa, Gou
    Asano, Tanemasa
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06)
  • [2] The effects of crystal filtering on growth of silicon grains in metal-induced lateral crystallization
    Kim, MS
    Lee, JS
    Kim, YS
    Joo, SK
    ELECTROCHEMICAL AND SOLID STATE LETTERS, 2006, 9 (02) : G56 - G58
  • [3] Control of the crystal orientation in metal-induced lateral crystallization
    Kim, MS
    Lee, JS
    Kim, YS
    Joo, SK
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2005, 47 : S404 - S407
  • [4] Metal-induced crystallization of amorphous silicon
    Yoon, SY
    Park, SJ
    Kim, KH
    Jang, J
    THIN SOLID FILMS, 2001, 383 (1-2) : 34 - 38
  • [5] Electric field-aided metal-induced lateral crystallization of amorphous silicon
    Department of Electronic Engineering, Tianjin University of Technology and Education, Tianjin 300222, China
    Zhenkong Kexue yu Jishu Xuebao, 2008, 4 (325-330):
  • [6] Dopant and thickness dependence of metal-induced lateral crystallization of amorphous silicon films
    Ma, TF
    Wong, M
    JOURNAL OF APPLIED PHYSICS, 2002, 91 (03) : 1236 - 1241
  • [7] Effect of amorphous silicon shape on its metal-induced lateral crystallization rate
    Kim, Y. -S.
    Kim, M. -S.
    Joo, S. -K.
    THIN SOLID FILMS, 2007, 515 (7-8) : 3387 - 3390
  • [8] Metal-induced lateral crystallization of amorphous silicon under reduced nickel supply
    Makihira, K
    Nozaki, H
    Asano, T
    Miyasaka, M
    POLYCRYSTALLINE SEMICONDUCTORS VII, PROCEEDINGS, 2003, 93 : 207 - 212
  • [9] In situ observation of nickel metal-induced lateral crystallization of amorphous silicon thin films
    Miyasaka, M
    Makihira, K
    Asano, T
    Polychroniadis, E
    Stoemenos, J
    APPLIED PHYSICS LETTERS, 2002, 80 (06) : 944 - 946
  • [10] Dopant effect on in situ doped metal-induced lateral crystallization of amorphous silicon films
    Hwang, JD
    Chang, JY
    Wu, CY
    APPLIED SURFACE SCIENCE, 2005, 249 (1-4) : 65 - 70