Very low dielectric constants of diamond-like carbon films deposited on ground electrode by plasma-enhanced chemical vapor deposition

被引:0
|
作者
Yokota, Katsuhiro [1 ]
Miyoshi, Yuuya [1 ]
Saoyama, Masaki [1 ]
机构
[1] Faculty of Engineering, HRC, Kansai University, Suita, Osaka 564-8680, Japan
关键词
Thin films;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:860 / 867
相关论文
共 50 条
  • [21] EFFECTS OF NITROGEN TRIFLUORIDE ON THE GROWTH AND PROPERTIES OF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITED DIAMOND-LIKE CARBON-FILMS
    ANG, SS
    SREENIVAS, G
    BROWN, WD
    NASEEM, HA
    ULRICH, RK
    JOURNAL OF ELECTRONIC MATERIALS, 1993, 22 (04) : 347 - 352
  • [22] Deposition of silicon-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition using an intermittent supply of organosilane
    Nakazawa, H.
    Kamata, R.
    Okuno, S.
    DIAMOND AND RELATED MATERIALS, 2015, 51 : 7 - 13
  • [23] Plasma enhanced chemical vapor deposition of 'diamond-like' carbon films from fluorinated feeds
    d'Agostino, R.
    Lamendola, R.
    Favia, P.
    Polymer Preprints, Division of Polymer Chemistry, American Chemical Society, 1993, 34 (01):
  • [24] Characterization of diamond-like carbon films formed by magnetically enhanced plasma chemical vapor deposition
    Inagawa, K
    Zeniya, T
    Hibino, N
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 344 - 347
  • [25] Fabrication of diamond-like carbon films using pseudo-spark discharge plasma-enhanced chemical vapor deposition method
    Kamada, Takaharu
    Sohma, Yoshitake
    Watanabe, Masayuki
    Mukaigawa, Seiji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (06)
  • [26] Evolution of optical properties with deposition time of silicon nitride and diamond-like carbon films deposited by radio-frequency plasma-enhanced chemical vapor deposition method
    Smietana, Mateusz
    Bock, Wojtek J.
    Szmidt, Jan
    THIN SOLID FILMS, 2011, 519 (19) : 6339 - 6343
  • [27] Synthesis of diamondlike carbon and diamond films by plasma-enhanced chemical vapor deposition
    Hayashi, Hidetaka
    Ohnishi, Yoshihiko
    Kobashi, Koji
    Nishimura, Kozo
    Miyata, Kohichi
    Kawate, Yoshio
    KOBELCO Technology Review, 1989, (06): : 14 - 17
  • [28] Plasma-enhanced chemical vapor deposition of fluorocarbon films with high thermal resistance and low dielectric constants
    Takeishi, S
    Kudo, H
    Shinohara, R
    Hoshino, M
    Fukuyama, S
    Yamaguchi, J
    Yamada, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (05) : 1797 - 1802
  • [29] Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique
    王静
    刘贵昌
    徐军
    邓新绿
    王立达
    Plasma Science and Technology, 2010, 12 (04) : 461 - 465
  • [30] Nanomechanical and Electrochemical Properties of Diamond-Like Carbon (DLC) Films Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Technique
    Wang Jing
    Liu Guichang
    Xu Jun
    Deng Xinlv
    Wang Lida
    PLASMA SCIENCE & TECHNOLOGY, 2010, 12 (04) : 461 - 465