Fluorescent resist materials for nanoimprint lithography

被引：0
|
作者：
Nakagawa, Masaru
机构：
来源：
Kobunshi | 2011年 / 60卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：139 / 140
相关论文
共 50 条
  • [41] Room temperature nanoimprint lithography using a bilayer of HSQ/PMMA resist stack
    Tao, JR
    Chen, YF
    Zhao, XZ
    Malik, A
    Cui, Z
    MICROELECTRONIC ENGINEERING, 2005, 78-79 : 665 - 669
  • [42] Impacts of Mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography
    Lin, Chien-Hung
    Chen, Rongshun
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) : 5197 - 5203
  • [43] Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography
    Uchida, Hiroki
    Imoto, Ryosuke
    Ando, Tadashi
    Okabe, Takao
    Taniguchi, Jun
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2021, 34 (02) : 139 - 144
  • [44] Novel Fluorinated Compounds as Release Materials for Nanoimprint Lithography
    Yamashita, Tsuneo
    Mitsuhashi, Hisashi
    Morita, Masamichi
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, 2013, 8680
  • [45] Surface force measurement of ultraviolet nanoimprint lithography materials
    Taniguchi, Jun
    Hasegawa, Masayuki
    Amemiya, Hironao
    Kobayashi, Hayato
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (02)
  • [46] Nanoimprint Lithography Processing of Inorganic-Based Materials
    Modaresialam, Mehrnaz
    Chehadi, Zeinab
    Bottein, Thomas
    Abbarchi, Marco
    Grosso, David
    CHEMISTRY OF MATERIALS, 2021, 33 (14) : 5464 - 5482
  • [47] Characterisation of new thermosetting polymer materials for nanoimprint lithography
    Lyebyedyev, D
    Schulz, H
    Scheer, HC
    Pfeiffer, K
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2001, 15 (1-2): : 241 - 243
  • [48] Organic-inorganic hybrid materials for nanoimprint lithography
    Katayama, Junko
    Yamaki, Shigeru
    Mitsuyama, Masahiro
    Hanabata, Makoto
    EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2, 2006, 6151 : U1189 - U1199
  • [49] Nanoimprint Lithography Materials Development for Semiconductor Device Fabrication
    Costner, Elizabeth A.
    Lin, Michael W.
    Jen, Wei-Lun
    Willson, C. Grant
    ANNUAL REVIEW OF MATERIALS RESEARCH, 2009, 39 : 155 - 180
  • [50] Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials
    Tada, Kazuhiro
    Kimoto, Yoshihisa
    Yasuda, Masaaki
    Kawata, Hiroaki
    Hirai, Yoshihiko
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06) : 06FH131 - 06FH133
12345