Characterization of Line-Edge roughness in Cu/Low-k interconnect pattern

被引：0
|
作者：
Yamaguchi, Atsuko [1 ]
Ryuzaki, Daisuke [1 ]
Takeda, Ken-Ichi [1 ]
Yamamoto, Jiro [1 ]
Kawada, Hiroki [2 ]
Iizumi, Takashi [2 ]
机构：
[1] Central Research Laboratory, Hitachi Ltd., Higashikoigakuho, Kokubunji, Tokyo 185-8601, Japan
[2] Hitachi High-Technologies Corp., Ichige, Hitachinaka, Ibaraki 312-8504, Japan
来源：
Japanese Journal of Applied Physics | 2008年 / 47卷 / 4 PART 2期
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页码：2501 / 2505
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