Growth of vanadium dioxide films by DC reactive magnetron sputtering

被引：0
|
作者：
Center of Vacuum Technology and Application, School of Machinery and Automobile Engineering, Hefei University of Technology, Hefei 230009, China [1 ]
机构：
来源：
Zhenkong Kexue yu Jishu Xuebao | 2008年 / 2卷 / 153-158期
关键词：
Oxide films;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Study of reactive DC magnetron sputtering deposition of AlN thin films
    Dimitrova, VI
    Manova, DI
    Dechev, DA
    VACUUM, 1998, 49 (03) : 193 - 197
  • [42] Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering
    Reddy, Y. Ashok Kumar
    Reddy, A. Mallikarjuna
    Reddy, A. Sivasankar
    Reddy, P. Sreedhara
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2012, 4 (04)
  • [43] Properties of AlNx thin films prepared by DC reactive magnetron sputtering
    Stafiniak, Andrzej
    Muszynska, Donata
    Szyszka, Adam
    Paszkiewicz, Bogdan
    Ptasinski, Konrad
    Patela, Sergiusz
    Paszkiewicz, Regina
    Tlaczala, Marek
    OPTICA APPLICATA, 2009, 39 (04) : 717 - 722
  • [44] Aluminium nitride thin films deposited by DC reactive magnetron sputtering
    Dimitrova, V
    Manova, D
    Paskova, T
    Uzunov, T
    Ivanov, N
    Dechev, D
    VACUUM, 1998, 51 (02) : 161 - 164
  • [45] Lead oxide thin films deposited by DC reactive magnetron sputtering
    State Key Lab. for Silicon Materials, Zhejiang University, Hangzhou 310027, China
    Zhenkong Kexue yu Jishu Xuebao, 2006, 2 (84-87):
  • [46] Preparation and Properties of TiN Thin Films by DC Reactive Magnetron Sputtering
    Shan Yu-qiao
    Gu Xun-lei
    Wang You-xin
    MULTI-FUNCTIONAL MATERIALS AND STRUCTURES II, PTS 1 AND 2, 2009, 79-82 : 2275 - 2278
  • [47] ALNX THIN-FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING
    SVUB, J
    MUSIL, J
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1985, 35 (10) : 1191 - 1192
  • [48] SYNTHESIS OF ZnO:N THIN FILMS BY REACTIVE DC MAGNETRON SPUTTERING
    Burinskas, S.
    Dudonis, J.
    Milcius, D.
    Karaliunas, M.
    Kuokstis, E.
    LITHUANIAN JOURNAL OF PHYSICS, 2010, 50 (03): : 325 - 333
  • [49] ADHESION OF THIN TIN FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
    MUSIL, J
    POULEK, V
    DUSEK, V
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1984, 34 (06) : 597 - 600
  • [50] Study of niobium nitride films produced by DC reactive magnetron sputtering
    Hotovy, I
    Buc, D
    Brcka, J
    Srnanek, R
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1997, 161 (01): : 97 - 104
12345