Growth of vanadium dioxide films by DC reactive magnetron sputtering

被引：0
|
作者：
Center of Vacuum Technology and Application, School of Machinery and Automobile Engineering, Hefei University of Technology, Hefei 230009, China [1 ]
机构：
来源：
Zhenkong Kexue yu Jishu Xuebao | 2008年 / 2卷 / 153-158期
关键词：
Oxide films;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Pulsed DC reactive magnetron sputtering of vanadium dioxide thermochromic thin films
    Batista, C.
    Teixeira, V.
    Ribeiro, R. M.
    MATERIALS TECHNOLOGY, 2011, 26 (01) : 35 - 39
  • [2] Reactive DC Magnetron Sputtering of Vanadium Oxide Thin Films
    Batista, C.
    Mendes, J.
    Teixeira, V.
    Carneiro, J.
    ADVANCED MATERIALS FORUM IV, 2008, 587-588 : 343 - 347
  • [3] Features of vanadium dioxide films deposition by reactive magnetron sputtering
    Komlev, A. E.
    Shutova, E. S.
    Sypko, M. P.
    26TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY, 2019, 1313
  • [4] Effect of temperature on the growth of vanadium oxide films deposited by DC reactive magnetron sputtering
    Du, Mingjun
    Wu, Zhiming
    Luo, Zhenfei
    Xu, Xiangdong
    Yu, Junsheng
    Jiang, Yadong
    5TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTOELECTRONIC MATERIALS AND DEVICES FOR DETECTOR, IMAGER, DISPLAY, AND ENERGY CONVERSION TECHNOLOGY, 2010, 7658
  • [5] Effect of substrate and growth method on vanadium dioxide thin films by RF magnetron sputtering: Vanadium metal oxidation vs reactive sputtering
    Christensen, A.
    Posadas, A. B.
    Zutter, B.
    Finnegan, P.
    Bhullar, S.
    Bishop, S.
    Talin, A. A.
    Demkov, A. A.
    JOURNAL OF APPLIED PHYSICS, 2023, 134 (01)
  • [6] Thermochromic properties of vanadium oxide films prepared by dc reactive magnetron sputtering
    Cui, Hai-Ning
    Teixeira, Vasco
    Meng, Li-Jian
    Wang, Rong
    Gao, Jin-Yue
    Fortunato, Elvira
    THIN SOLID FILMS, 2008, 516 (07) : 1484 - 1488
  • [7] Growth and properties of CNx films prepared by reactive DC magnetron sputtering
    Jin, YS
    Matsuda, Y
    Fujiyama, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1998, 37 (08): : 4544 - 4549
  • [8] Growth and properties of CNx films prepared by reactive DC magnetron sputtering
    Jin, Y.-S.
    Matsuda, Y.
    Fujiyama, H.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (08): : 4544 - 4549
  • [9] Preparation and characterization of vanadium dioxide films by magnetron sputtering
    Han, Bin
    Zhao, Qingnan
    Yang, Xiaodong
    Zhao, Xiujian
    Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2009, 38 (04): : 717 - 721
  • [10] Preparation and Characterization of Vanadium Dioxide Films by Magnetron Sputtering
    Han Bin
    Zhao Qingnan
    Yang Xiaodong
    Zhao Xiujian
    RARE METAL MATERIALS AND ENGINEERING, 2009, 38 (04) : 717 - 721
12345