Structural characterization of TiN/HAp and ZrO2/HAp thin films deposited onto Ti-6Al-4V alloy by magnetron sputtering

被引：0
|
作者：
Molagic, Alina [1 ]
机构：
[1] Managerial Agency for Scientific Research, Innovation and Tehnological Transfer - Politehnica, Bucharest, Romania
来源：
UPB Scientific Bulletin, Series B: Chemistry and Materials Science | 2010年 / 72卷 / 01期
关键词：
Aluminum alloys - Aluminum coatings - Metal substrates - Adhesion - Titanium alloys - Hydroxyapatite - Magnetron sputtering - Ternary alloys - Thin films - Titanium nitride - Biocompatibility - Tin;
D O I：
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学科分类号：
摘要：
Radio frequency (RF) magnetron sputtering is a promising deposition technique that can produce dense and well-adhered films. This technique was applied to deposit thin TiN/HAp and ZrO2/HAp films on titanium implants. The TiN interlayer plays an important role in improving adhesion of HAp to substrate and preserve the direct contact of the tissue with metallic substrate in case of possible crack of HAp coating. The chemical and structural compositions of the coating, adhesion and thickness have been investigated by using XRD, FTIR and EDX measurements.
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页码：187 / 194
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