Reactive ion etching of carbon nanowalls

被引：0
|
作者：
Kondo, Shingo [1 ]
Kondo, Hiroki [1 ]
Miyawaki, Yudai [1 ]
Sasaki, Hajime [1 ]
Kano, Hiroyuki [1 ,2 ]
Hiramatsu, Mineo [1 ,3 ]
Hori, Masaru [1 ]
机构：
[1] Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 464-8603, Japan
[2] NU-Eco Engineering Co., Ltd., Miyoshi, Aichi 470-0201, Japan
[3] Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Nagoya 468-8502, Japan
来源：
Japanese Journal of Applied Physics | 2011年 / 50卷 / 7 PART 1期
关键词：
Compendex;
D O I：
075101
中图分类号：
学科分类号：
摘要：
Substrates
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