Extreme ultraviolet and visible emission spectroscopic characterization of CO2 laser produced tin plasma for lithography

被引：0
|
作者：
Wu, Tao [1 ,2 ]
Wang, Xinbing [1 ]
Tang, Jian [1 ]
Wang, Shaoyi [1 ]
Rao, Zhiming [1 ]
Yang, Chenguang [1 ]
Lu, Hong [1 ]
机构：
[1] Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
[2] School of Science, Wuhan Institute of Technology, Wuhan, Hubei 430074, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 2012年 / 32卷 / 04期
关键词：
D O I：
10.3788/AOS201232.0430002
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] Spectroscopic analysis of temperature and density of Sn plasma produced by a CO2 laser
    Shaikh, Nek M.
    Tao, Y.
    Burdt, R. A.
    Yuspeh, S.
    Amin, N.
    Tillack, M. S.
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (08)
  • [42] Three-dimensional simulation of laser-produced plasma for extreme ultraviolet lithography applications
    Sizyuk, V.
    Hassanein, A.
    Sizyuk, T.
    JOURNAL OF APPLIED PHYSICS, 2006, 100 (10)
  • [43] Three-dimensional simulation of laser-produced plasma for extreme ultraviolet lithography applications
    Sizyuk, V.
    Hassanein, A.
    Sizyuk, T.
    Journal of Applied Physics, 2006, 100 (10):
  • [44] Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas -: art. no. 041503
    Tanaka, H
    Matsumoto, A
    Akinaga, K
    Takahashi, A
    Okada, T
    APPLIED PHYSICS LETTERS, 2005, 87 (04)
  • [45] Efficient 13.5 nm extreme ultraviolet emission from Sn plasma irradiated by a long CO2 laser pulse
    Tao, Y.
    Tillack, M. S.
    Sequoia, K. L.
    Burdt, R. A.
    Yuspeh, S.
    Najmabadi, F.
    APPLIED PHYSICS LETTERS, 2008, 92 (25)
  • [46] Spatial and spectral characterization of a laser produced plasma source for extreme ultraviolet metrology
    Legall, H
    Stiel, H
    Vogt, U
    Schönnagel, H
    Nickles, PV
    Tümmler, J
    Scholz, F
    Scholze, F
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2004, 75 (11): : 4981 - 4988
  • [47] Mitigation of ion and particulate emission from laser-produced plasmas used for extreme ultraviolet lithography
    Di Lazzaro, Paolo
    Bollanti, Sarah
    Flora, Francesco
    Mezi, Luca
    Murra, Daniele
    Torre, Amalia
    APPLIED SURFACE SCIENCE, 2013, 272 : 13 - 18
  • [48] Characteristics of extreme ultraviolet emission from Gd plasma produced by dual pulse laser
    Xie Zhuo
    Wen Zhi-Lin
    Si Ming-Qi
    Dou Yin-Ping
    Song Xiao-Wei
    Lin Jing-Quan
    ACTA PHYSICA SINICA, 2022, 71 (03)
  • [49] Liquid Tin Droplet Generator in Laser-Produced Plasma Extreme Ultraviolet Source: A Review
    Sun, Qin
    Qi, Huiming
    Wang, Xinbing
    Zuo, Duluo
    IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT, 2024, 73 : 1 - 1
  • [50] Spectroscopic study of debris mitigation with minimum-mass Sn laser plasma for extreme ultraviolet lithography
    Namba, S
    Fujioka, S
    Nishimura, H
    Yasuda, Y
    Nagai, K
    Miyanaga, N
    Izawa, Y
    Mima, K
    Takiyama, K
    APPLIED PHYSICS LETTERS, 2006, 88 (17)
12345