Pad surface treatment to control performance of chemical mechanical planarization

被引：0
|
作者：
Park, Jaehong [1 ,2 ]
Juno, Haedo [1 ]
Yoshida, Koichi [2 ]
Kinoshita, Masaharu [2 ]
机构：
[1] Department of Precision Mechanical Engineering, Pusan National University, Changjeon-dong, Kumjung-gu, Pusan 609-735, Korea, Republic of
[2] Nitta-Haas Inc., Kannabidai, Kyotanahe, Kyoto 610-0333, Japan
来源：
Japanese Journal of Applied Physics | 2008年 / 47卷 / 2 PART 1期
关键词：
High frequency components - Low-frequency components - Mechanical surface treatment - Mechanical treatments - Polishing pads - Profile - Removal rate - Uniformity;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1028 / 1033
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