Power efficiency enhancement in high-rate deposition of microcrystalline silicon coatings

被引：0
|
作者：
Xu, Shengzhi [1 ]
Zhang, Xiaodan [1 ]
Ren, Huizhi [1 ]
Zhao, Ying [1 ]
机构：
[1] Institute of Photo-Electronics Thin Film Devices and Technology, Tianjin Key Laboratory of Photo-Electronics Thin Film Devices and Technology, Nankai University, Tianjin 300071, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2013年 / 33卷 / 06期
关键词：
6;
D O I：
10.3969/j.issn.1672-7126.2013.06.20
中图分类号：
学科分类号：
摘要：
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页码：615 / 618
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