Investigation of a novel nanodiamond-impregnated polishing pad for oxide chemical mechanical polishing

被引：0
|
作者：
Tsai, Ming-Yi [1 ]
Chen, Chien-Hsun [1 ]
机构：
[1] Department of Mechanical Engineering, National Chin-Yi University of Technology, Taichung County, 411, Taiwan
来源：
Journal of Technology | 2013年 / 28卷 / 04期
关键词：
Chemical mechanical polishing;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：235 / 241
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