Influence of substrate temperature on structural and optical properties of HfO2 thin films

被引：1

作者：

Zhao H. ^{[1
]}

Ma Z. ^{[1
]}

Li J. ^{[1
]}

Liu L. ^{[1
]}

Zhang H. ^{[1
]}

Xie Y. ^{[1
]}

Su Y. ^{[1
]}

Xie E. ^{[1
]}

机构：

[1] Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2010年 / 22卷 / 01期

关键词：

Crystal structure; Direct current reactive magnetron sputtering; HfO[!sub]2[!/sub] thin films; Optical band gap; Refractive index; Substrate temperature;

D O I：

10.3788/HPLPB20102201.0071

中图分类号：

学科分类号：

摘要：

HfO2 films were deposited by direct current reactive magnetron sputtering on n-type Si(100) substrates and fused silica substrates, respectively. The substrate temperature ranges from room temperature to 500 °C. The influence of substrate temperature on structure and optical properties of the films was investigated by X-ray diffraction(XRD), spectroscopic ellipsometry(SE) and ultraviolet visible spectroscopy(UV-vis). XRD results show that all deposited films are polycrystalline with monoclinic structure. As the substrate temperature increases, the preferred orientation of (-111) becomes more obvious, and the grain size of HfO2 films increases. SE and UV-vis results demonstrate that, with the substrate temperature increasing, the refractive index increases and the optical band gap decreases. An excellent transmittance, exceeding 80% in the range from 250 nm to 850 nm, is obtained for all samples.

引用

页码：71 / 74

页数：3

共 14 条

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