Effect of the incident angle to the compatible camouflage of photonic crystals film of far infrared and laser band

被引:0
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作者
Wang, Chao [1 ]
Shi, Jia-Ming [1 ]
Zhao, Da-Peng [1 ]
Wang, Jia-Chun [1 ]
Chen, Zong-Sheng [1 ]
Lin, Zhi-Dan [1 ]
Wang, Zheng-Qiu [2 ]
Xiao, Gui-Lin [3 ]
机构
[1] State Key Laboratory of Pulsed Power Laser Technology, Electronic Engineering Institute, Hefei 230037, China
[2] The 73680 Unit of PLA, Nanjing 211112, China
[3] The 73156 Unit of PLA, Zhangzhou 363900, China
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页码:635 / 638
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