Dram technology

被引:0
|
作者
Venables M.
机构
来源
Engineering and Technology | 2010年 / 5卷 / 10期
关键词
D O I
10.1049/et.2010.1011
中图分类号
学科分类号
摘要
The new Bunnahabhain Distillery located in Scottish Isle of Islay is renowned for the distillation of single malt whisky. Most of the malt used for the production of whisky on Islay is done at Port Ellen Maltings according to the specific peat level requirements of various distilleries of the region. The Bunnahabhain distillery built in 1881, includes equipment that date from the early 1960s, excluding new set of two boilers that were fitted in 2007. Bunnahabhain buys its malt from the Simpsons Maltery on the mainland at Berwick. The maltery buy good quality barley and sell it to Bunnahabhain malted to its specification, which include a certain moisture and phenol content. The distillery is unique on the island because it uses water from a spring, catching it at source and it is then piping it to a holding tank and on to the distillery.
引用
收藏
页码:56 / 58
页数:2
相关论文
共 50 条
  • [21] Future directions for DRAM memory cell technology
    Nitayama, A
    Kohyama, Y
    Hieda, K
    INTERNATIONAL ELECTRON DEVICES MEETING 1998 - TECHNICAL DIGEST, 1998, : 355 - 358
  • [22] Highly manufacturable 90 nm DRAM technology
    Park, YK
    Cho, CH
    Lee, KH
    Roh, BH
    Ahn, YS
    Lee, SH
    Oh, JH
    Lee, JG
    Kwak, DH
    Shin, SH
    Bae, JS
    Kim, SB
    Lee, JK
    Lee, JY
    Kim, MS
    Lee, JW
    Lee, DJ
    Hong, SH
    Bae, DI
    Chun, YS
    Park, SH
    Yun, CJ
    Chung, TY
    Kim, K
    INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST, 2002, : 819 - 822
  • [23] A new type of SRAM using DRAM technology
    Kihara, Yuji
    Okamura, Leona
    Nakashima, Yasushi
    Izutsu, Takashi
    Nakamoto, Masayuki
    Yoshihara, Tsutomu
    ELECTRONICS AND COMMUNICATIONS IN JAPAN PART II-ELECTRONICS, 2007, 90 (09): : 32 - 41
  • [24] Embedded DRAM technology: past, present and future
    Toshiba Corp, Yokohama, Japan
    Int Symp VLSI Technol Syst Appl Proc, (239-242):
  • [26] Low temperature capacitor technology for embedded DRAM
    Lo, CG
    Yu, CH
    Chien, WTK
    Huang, CHJ
    2001 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS, AND APPLICATIONS, PROCEEDINGS OF TECHNICAL PAPERS, 2001, : 105 - 108
  • [27] Feasibility of Embedded DRAM Cells on FinFET Technology
    Amat, Esteve
    Calomarde, Antonio
    Moll, Francesc
    Canal, Ramon
    Rubio, Antonio
    IEEE TRANSACTIONS ON COMPUTERS, 2016, 65 (04) : 1068 - 1074
  • [28] Integration of rapid thermal processing into DRAM technology
    Weimer, RA
    ULSI PROCESS INTEGRATION, 1999, 99 (18): : 59 - 72
  • [29] Technology Migration Determination Model for DRAM Industry
    Tu, Ying-Mei
    Wang, Chao-I
    ICEIS: PROCEEDINGS OF THE 15TH INTERNATIONAL CONFERENCE ON ENTERPRISE INFORMATION SYSTEMS, VOL 1, 2013, : 389 - 394
  • [30] UNITED-STATES INVESTS IN DRAM TECHNOLOGY
    BOTTOMS, DT
    ELECTRONICS-US, 1993, 66 (08): : 5 - 5