Small-signal and noise model of fully depleted silicon-on-insulator metal-oxide-semiconductor devices for low-noise amplifier

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作者
Kim, Guechol [1 ]
Murakami, Bunsei [1 ]
Goto, Masaru [1 ]
Kihara, Takao [1 ]
Nakamura, Keiji [1 ]
Shimizu, Yoshiyuki [1 ]
Matsuoka, Toshimasa [1 ]
Taniguchi, Kenji [1 ]
机构
[1] Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan
关键词
An RF small-signal and noise model of fully depleted silicon-on-insulator (FD-SOI) metal-oxide-semiconductor field effect transistor (MOSFET) is presented. The model together with its intrinsic model parameters extracted from de-embedding extrinsic parameters reproduces the frequency and noise response of FD-SOI MOSFETs. We have applied the proposed model to a low-noise amplifier (LNA) operating at 5.5 GHz; which is implemented in a 0.15 μm FD-SOI complementary metal-oxide-semiconductor (CMOS) technology. The simulated small-signal and noise performance of the LNA are in good agreement with the measured data of the fabricated LNA. © 2006 The Japan Society of Applied Physics;
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页码:6872 / 6877
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