Linear growth kinetics of nanometric silicides in Co/amorphous-Si and Co/CoSi/amorphous-Si thin films

被引：0

作者：

Cserháti, C. ^{[1
]}

Balogh, Z. ^{[1
]}

Csik, A. ^{[1
]}

Langer, G.A. ^{[1
]}

Erdélyi, Z. ^{[1
]}

Glodán, Gy. ^{[1
]}

Katona, G.L. ^{[1
]}

Beke, D.L. ^{[1
]}

Zizak, I. ^{[2
]}

Darowski, N. ^{[2
]}

Dudzik, E. ^{[2
]}

Feyerherm, R. ^{[2
]}

机构：

[1] Department of Solid State Physics, University of Debrecen, P. O. Box. 2, H-4010 Debrecen, Hungary

[2] Hahn-Meitner-Institut Berlin, Glienicker Straße 100, D-14109 Berlin, Germany

来源：

Journal of Applied Physics | 2008年 / 104卷 / 02期

关键词：

D O I：

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学科分类号：

摘要：

Journal article (JA)

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