Single Event Effects of Low-Voltage N-Type and P-Type Trench-Gate MOSFET Devices

被引:0
|
作者
Wu, Hao [1 ]
Hu, Shengdong [2 ]
Xiang, Fan [3 ]
Fu, Xiaojun [1 ]
Wang, Yan [1 ]
Luo, Jun [3 ]
Yang, Manlin [1 ]
Wang, Ziwei [1 ]
Yang, Xiaoyu [1 ]
机构
[1] Natl Key Lab Integrated Circuits & Microsyst, Chongqing 401332, Peoples R China
[2] Chongqing Univ, Sch Microelect & Commun Engn, Chongqing 400030, Peoples R China
[3] China Elect Technol Grp Corp, Res Inst 24, Chongqing 401332, Peoples R China
关键词
Trench-gate MOSFETs; single event effect; SEE-hardened; safe operating area; SEGR;
D O I
10.1109/LED.2024.3477444
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Silicon based MOSFETs are one of the most popular devices in electronic fields due to their electrical stability and mature system integration compared with other wide band-gap materials. Researches of total ionizing dose effect and single event effect on the radiation effects and radiation hardened approaches of planar-gate MOSFET devices are widely carried out. While mechanisms on irradiation effects of trench-gate MOSFET devices are still under research. To deeply understand the single event effects of trench-gate MOSFET devices, we fabricated four types of radiation hardened trench-gate MOSFET devices, two of which are N-type (30V and 60V) and the other two are P-type (30V and 55V). Different from planar-gate MOSFET devices, single event gate rupture of trench-gate MOSFET devices is less severe, due to the fact that the energy is weakened during the long path of the trench gate. After designing and fabricating novel SEE-hardened devices, SEE experimental results indicate that both the designed N-type and P-type fabricated trench-gate MOSFET devices can bear 75 MeV(mg/cm(2)) at their separate BVDSS. And all the single event safe operating areas are shown.
引用
收藏
页码:2288 / 2290
页数:3
相关论文
共 50 条
  • [1] Breakdown Voltage Walk-in Phenomenon and Optimization for the Trench-Gate p-Type VDMOS Under Single Avalanche Stress
    Tong, Xin
    Liu, Qian
    Lu, Li
    Liu, Siyang
    Wei, Jiaxing
    Sun, Weifeng
    Wu, Jianhui
    Wang, Genyi
    Yang, Zhuo
    Zhu, Yuanzheng
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, 67 (06) : 2445 - 2450
  • [2] Single layer electroluminescent devices based on blends of p-type and n-type polymers
    Tan, Hai-Shu
    Zhou, Kai-Shun
    Yao, Jian-Quan
    Wang, Xiao-Yong
    Wang, Peng
    Chen, Li-Chun
    Guangdianzi Jiguang/Journal of Optoelectronics Laser, 2002, 13 (06): : 567 - 570
  • [3] Trench-Gate MOSFET Application as Active Fuse in Low Voltage Battery Management System
    Musumeci, Salvatore
    Scrimizzi, Filippo
    Longo, Giuseppe
    Mistretta, Carmelo
    Cavallaro, Daniela
    2020 2ND IEEE INTERNATIONAL CONFERENCE ON INDUSTRIAL ELECTRONICS FOR SUSTAINABLE ENERGY SYSTEMS (IESES), 2020, : 387 - 392
  • [4] N-TYPE AND P-TYPE SINGLE CRYSTAL BISMUTH TELLURIDE
    YANG, AC
    SHEPHERD, FD
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (02) : 197 - 198
  • [5] Low Voltage Trench-Gate MOSFET Power Losses Optimization in Synchronous Buck Converter Applications
    Armando, E.
    Musumeci, S.
    Fusillo, F.
    Scrimizzi, F.
    2019 21ST EUROPEAN CONFERENCE ON POWER ELECTRONICS AND APPLICATIONS (EPE '19 ECCE EUROPE), 2019,
  • [6] Low Voltage High Current Trench-Gate MOSFET Inverter for Belt Starter Generator Applications
    Musumeci, Salvatore
    Scrimizzi, Filippo
    Fusillo, Filadelfo
    Bojoi, Radu
    Longo, Giuseppe
    Mistretta, Carmelo
    2019 AEIT INTERNATIONAL CONFERENCE OF ELECTRICAL AND ELECTRONIC TECHNOLOGIES FOR AUTOMOTIVE (AEIT AUTOMOTIVE), 2019,
  • [7] Fabrication of n-type and p-type WSe2 field-effect transistors and their low-voltage CMOS inverter operation
    Kawanago, Takamasa
    Muneta, Iriya
    Hoshii, Takuya
    Kakushima, Kuniyuki
    Tsutsui, Kazuo
    Wakabayashi, Hitoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2025, 64 (02)
  • [8] ELECTROPOLISHING OF N-TYPE GERMANIUM AND P-TYPE AND N-TYPE SILICON
    KLEIN, DL
    KOLB, GA
    POMPLIANO, LA
    SULLIVAN, MV
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (03) : C60 - C60
  • [9] COMPENSATING EFFECTS OF PLATINUM IN N-TYPE AND P-TYPE SILICON
    CATANIA, ME
    CALCAGNO, L
    COFFA, S
    CAMPISANO, SU
    RASPAGLIESI, M
    FERLA, G
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 52 (02): : 119 - 122
  • [10] A novel low-voltage N-channel heterostructure dynamic threshold voltage MOSFET (N-HDTMOS) with p-type doped SiGe body
    Kawashima, T
    Hara, Y
    Kanzawa, Y
    Sorada, H
    Inoue, A
    Asai, A
    Takagi, T
    IEEE ELECTRON DEVICE LETTERS, 2004, 25 (01) : 28 - 30