Influence of electron scattering on resist pattern edge roughness in low dose electron beam lithography

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Dept. of Electronics, Information and Communication Eng., Osaka Inst. of Tech., Asahi-ku, Osaka, 535-8585 [1 ]
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Zairyo | 2006年 / 2卷 / 177-182期
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10.2472/jsms.55.177
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