Growth of znte:o thin films by oxygen-plasma-assisted pulsed laser deposition

被引:0
|
作者
Pak, Sang Woo [1 ]
Suh, Jooyoung [1 ]
Lee, Dong Uk [1 ]
Kim, Eun Kyu [1 ]
机构
[1] Quantum-Function Research Laboratory and Department of Physics, Hanyang University, Seoul 133-791, Korea, Republic of
关键词
Band edge - Intermediate bands - Oxygen ambient - Oxygen incorporation - Oxygen partial pressure - Oxygen plasmas - Radiative properties - ZnTe thin films;
D O I
01AD04
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [21] Role of oxygen pressure in growth of CeAlOx thin films on Si by pulsed laser deposition
    Yan, L
    Kong, LB
    Pan, JS
    Ong, CK
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (01) : 594 - 597
  • [22] Role of oxygen pressure in growth of CeAIOx thin films on Si by pulsed laser deposition
    Yan, L. (iesyl@nus.edu.sg), 1600, American Institute of Physics Inc. (94):
  • [23] Low temperature growth of In2O3 films via pulsed laser deposition with oxygen plasma
    Pan, Chengyu
    Saito, Katsuhiko
    Tanaka, Tooru
    Guo, Qixin
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 60 (05)
  • [24] Matrix assisted pulsed laser deposition of melanin thin films
    Bloisi, F.
    Pezzella, A.
    Barra, M.
    Chiarella, F.
    Cassinese, A.
    Vicari, L.
    JOURNAL OF APPLIED PHYSICS, 2011, 110 (02)
  • [25] Ultraviolet assisted pulsed laser deposition of thin oxide films
    Craciun, V
    Howard, J
    Singh, RK
    MULTICOMPONENT OXIDE FILMS FOR ELECTRONICS, 1999, 574 : 193 - 197
  • [26] Growth of p-type ZnTe thin films by using nitrogen doping during pulsed laser deposition
    Lee, Kyoung Su
    Oh, Gyujin
    Kim, Eun Kyu
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2015, 67 (04) : 672 - 675
  • [27] Growth of p-type ZnTe thin films by using nitrogen doping during pulsed laser deposition
    Kyoung Su Lee
    Gyujin Oh
    Eun Kyu Kim
    Journal of the Korean Physical Society, 2015, 67 : 672 - 675
  • [28] Pulsed laser deposition vs. matrix assisted pulsed laser evaporation for growth of biodegradable polymer thin films
    A.L. Mercado
    C.E. Allmond
    J.G. Hoekstra
    J.M. Fitz-Gerald
    Applied Physics A, 2005, 81 : 591 - 599
  • [29] Plasma parameters in pulsed laser-plasma deposition of thin films
    Bremen Inst of Applied Beam, Technology, Bremen, Germany
    Appl Surf Sci, (122-125):
  • [30] Plasma parameters in pulsed laser-plasma deposition of thin films
    Metev, S
    Ozegowski, M
    Sepold, G
    Burmester, S
    APPLIED SURFACE SCIENCE, 1996, 96-8 : 122 - 125