Voltage controlled magnetic properties and perpendicular magnetic anisotropy of Co2FeSi alloy thin films

被引:0
|
作者
Mei, Jiaming [1 ]
Galivarapu, Jagadish Kumar [1 ]
Wang, Shangqian [1 ]
Huang, Buyun [1 ]
Bharathi, K. Kamala [2 ]
Wang, Ke [1 ]
机构
[1] East China Univ Technol, Sch Mech & Elect Engn, Nanchang 330013, Peoples R China
[2] SRM Inst Sci & Technol, Dept Phys & Nanotechnol, Chennai 603203, India
基金
中国国家自然科学基金;
关键词
D O I
10.1007/s10854-024-13849-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A series of Pt/Co2FeSi/MgAl2O4/Pt thin films with Co2FeSi thicknesses ranging from 4.5 to 6 nm are constructed to evaluate the influence of applied voltage on magnetic coercivity. It is found that the change in coercivity is around 50.04% at an applied voltage of 16 V for a 5.5 nm thin film, but increases significantly to 72.24% for a 6 nm thin film. We show evolution of perpendicular magnetic anisotropy (PMA) properties of Co2FeSi amorphous thin films with varying thickness. The polarization of External Hall Effect (EHE) and Magneto-Optic Kerr Effect (MOKE) loops match well with magnetic hysteresis. The EHE coefficient Rs rises from 2.0 x 10-10 to 5.5 x 10-10 Omega cm/G with increase in thickness from 4 nm to 6.5 nm, respectively. The voltage controlled the magnetic properties of Co2FeSi thin films might be beneficial in the development of low-power magnetic tunnel junctions [MTJs].
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页数:7
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