The effect of the substrate temperature on the parameters of aluminum oxide films during electron beam evaporation of aluminum in an oxygen atmosphere

被引：0

作者：

Burdovitsin V.A. ^{[1
]}

Karpov K.I. ^{[1
]}

Ngon L.J. ^{[1
]}

Kiki A. ^{[1
]}

Oks E.M. ^{[1
]}

机构：

[1] Tomsk State University of Control Systems and Radioelectronics, 40 Lenin Ave., Tomsk

来源：

Applied Physics | 2024年 / 24卷 / 01期

关键词：

aluminum oxide films; electron beam evaporation of aluminum; fore-vacuum electron source; oxygen-containing medium; reaction of aluminum with oxygen;

D O I：

10.51368/1996-0948-2024-1-58-63

中图分类号：

学科分类号：

摘要：

Experimental results of measuring the parameters of aluminum oxide films deposited by electron beam evaporation of aluminum in oxygen at different substrate temperatures are presented. It is shown that the nature of the temperature effect is determined by the ratio of oxygen pressure and the film deposition rate. © 2024 ORION Research-and-Production Association. All rights reserved.

引用

页码：58 / 63

页数：5

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