Influence of substrates and e-beam evaporation parameters on the microstructure of nanocrystalline and epitaxially grown Ti thin films

被引：0
|
作者：
Devulapalli, Vivek [1 ]
Bishara, Hanna [1 ]
Ghidelli, Matteo [1 ,2 ]
Dehm, Gerhard [1 ]
Liebscher, C.H. [1 ]
机构：
[1] Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, Düsseldorf,D-40237, Germany
[2] Laboratoire des Sciences des Procédés et des Matériaux (LSPM), CNRS, Université Sorbonne Paris Nord, Villetaneuse,93430, France
来源：
Applied Surface Science | 2021年 / 562卷
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All Open Access; Green;
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摘要：
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