Impact of Work-Function Variation in Ferroelectric Field-Effect Transistor

被引:0
|
作者
Jung, Su Yeon [1 ]
Kim, Hyunwoo [2 ]
Lee, Jongmin [1 ]
Kim, Jang Hyun [1 ]
机构
[1] Ajou Univ, Dept Intelligence Semicond Engn, Suwon 16499, South Korea
[2] Konkuk Univ, Dept Elect & Elect Engn, Gwangjin 05029, South Korea
来源
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY | 2024年 / 12卷
基金
新加坡国家研究基金会;
关键词
Iron; FeFETs; Logic gates; Transistors; Performance evaluation; Ferroelectric field-effect transistor (FeFET); work-function variation (WFV); ferroelectric; ferroelectricity (FE); dipole alignment; electric field; THRESHOLD VOLTAGE;
D O I
10.1109/JEDS.2024.3465594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We analyzed the impact of work-function variation (WFV) in ferroelectric field-effect transistor (FeFET). To analyze the operation characteristics, we employed the technology computer-aided design (TCAD) simulations. After evaluating ferroelectricity (FE) characteristics and optimizing device model parameters through calibration, we extracted five key parameters from the hysteretic transfer curves of the FeFET: threshold voltage (V-th), on current (I-on), subthreshold swing (SS), off current (I-off), and gate-induced drain leakage (GIDL). The extracted parameters were compared based on the presence or absence of FE and the ferroelectric thickness. It was confirmed that the presence of FE leads to increased variation due to dipole alignment with WFV, and that the electric field is maintained even with an increase in ferroelectric thickness
引用
收藏
页码:779 / 784
页数:6
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