Work-Function-Dependent Reduction of Transition Metal Nitrides in Hydrogen Environments

被引:1
|
作者
Rehman, Abdul [1 ]
van de Kruijs, Robbert W. E. [1 ]
van den Beld, Wesley T. E. [1 ]
Sturm, Jacobus M. [1 ]
Ackermann, Marcelo [1 ]
机构
[1] Univ Twente, MESA Inst Nanotechnol, Ind Focus Grp XUV Opt, Drienerlolaan 5, NL-7522 NB Enschede, Netherlands
来源
JOURNAL OF PHYSICAL CHEMISTRY LETTERS | 2024年 / 15卷 / 46期
关键词
UNIVERSAL ALIGNMENT; SEMICONDUCTORS; XPS;
D O I
10.1021/acs.jpclett.4c02259
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Amidst the growing importance of hydrogen in a sustainable future, it is crucial to develop coatings that can protect hydrogen-sensitive system components in reactive hydrogen environments. However, the prediction of the chemical stability of materials in hydrogen is not fully understood. In this study, we show that the work function is a key parameter determining the reducibility (i.e., denitridation) of transition metal nitrides (TMNs) in hydrogen radicals (H*) at elevated temperatures. We demonstrate that, when the work function of a TMN system drops below a threshold limit (phi TH), its reduction effectively stops. We propose that this is due to the preferential binding of H* to transition metal (TM) atoms rather than N atoms, which makes the formation of volatile species (NH x ) unfavorable. This finding provides a novel perspective for comprehending the interaction of hydrogen with TM compounds and allows prediction of the chemical stability of hydrogen-protective coatings.
引用
收藏
页码:11462 / 11467
页数:6
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