The effect of doping donor ions in the dielectric properties of (In 0.5 B 0.5 ) 0.1 Ti 0.9 O 2 (B--V, Nb, Ta) ceramics

被引:4
|
作者
Xue, Ying [1 ]
Wang, Zhuo [1 ]
Kang, Jinteng [1 ]
Zhao, Ting [1 ]
Ye, Ronghui [1 ]
Li, Xin [1 ]
机构
[1] Shaanxi Univ Sci & Technol, Sch Mat Sci & Engn, Shaanxi Key Lab Green Preparat & Functionalizat In, Xuefu Zhonglu 3, Xian 710021, Peoples R China
基金
中国国家自然科学基金;
关键词
Sol-gel method; Donor ions; Carriers; Grain boundary resistance; PERFORMANCE COLOSSAL PERMITTIVITY; NIOBIUM; TEMPERATURE; EUROPIUM; MICROSTRUCTURE; BEHAVIORS; BATIO3; (LI; LI; SM;
D O I
10.1016/j.ceramint.2024.02.219
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
With the rapid development of integrated circuits, TiO2-based colossal dielectric constant ceramics have been widely studied as a critical alternative material in MLCC (Multilayer Ceramic Capacitors). However, the preparation technique is primarily based on the traditional solid-phase reaction method. In this work, (In 0.5 V 0.5 ) 0.1 Ti 0.9 O 2 , (In 0.5 Nb 0.5 ) 0.1 Ti 0.9 O 2 , and (In 0.5 Ta 0.5 ) 0.1 Ti 0.9 O 2 (abbreviated as IVTO, INTO, and ITTO) ceramics were prepared by a sol-gel method. In comparison, Nb5+ (r = 0.64 & Aring;) and Ta5+ (r = 0.65 & Aring;) have close ionic radii, which are more susceptible to Ti4+ (r = 0.745 & Aring;) sites substitution than V 5+ of a small ionic radius (r = 0.54 & Aring;), effectively facilitating the carrier concentration. Meanwhile, the Ta5+ has another advantage in refining the ceramic grain size to further improve grain boundary resistance. The ITTO ceramics show a colossal dielectric constant of 9.3 x 104, low dielectric loss of 0.07 (1 kHz, room temperature), and stable temperature application range for X9F (-55 degrees C-200 degrees C, Delta epsilon r /epsilon 25 degrees C <= +/- 7.5 %). The dielectric mechanism is related to the internal barrier layer capacitance (IBLC) effect. Thus, this work as a novel strategy provides an effective mean for further development of future colossal dielectric constant materials.
引用
收藏
页码:51848 / 51857
页数:10
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