Effects of plasticizing additives in ArF chemically amplified resists

被引：0
|
作者：
Yoshino, H.
Nakata, T.
Yamana, M.
Takimoto, M.
Hashimoto, T.
机构：
来源：
NEC Research and Development | 2001年 / 42卷 / 01期
关键词：
Resist softening temprature;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：32 / 36
相关论文
共 50 条
  • [21] Free volume effects in chemically amplified DUV positive resists
    France Telecom, Meylan, France
    Microelectron Eng, 1-4 (271-274):
  • [22] Radiation chemistry in chemically amplified resists
    Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
    Jpn. J. Appl. Phys., 3 PART 1
  • [23] Photoacid generators in chemically amplified resists
    Suzuki, Y
    Johnson, DW
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2, 1998, 3333 : 735 - 746
  • [24] Radiation Chemistry in Chemically Amplified Resists
    Kozawa, Takahiro
    Tagawa, Seiichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (03)
  • [25] Functional imaging with chemically amplified resists
    Vekselman, AM
    Zhang, CH
    Darling, GD
    MICROELECTRONICS TECHNOLOGY: POLYMERS FOR ADVANCED IMAGING AND PACKAGING, 1995, 614 : 149 - 165
  • [26] Form of deprotection in chemically amplified resists
    Jones, RL
    Hu, TJ
    Prabhu, VM
    Soles, CL
    Lin, EK
    Wu, WL
    Goldfarb, DL
    Angelopoulos, M
    CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY, 2003, 683 : 429 - 433
  • [27] THE DEVELOPMENT OF DUV CHEMICALLY AMPLIFIED RESISTS
    THACKERAY, JW
    FEDYNYSHYN, TH
    SMALL, RD
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1993, 205 : 43 - PMSE
  • [28] ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESISTS
    NAKAMURA, J
    BAN, H
    TANAKA, A
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 93 - PMSE
  • [29] Electron dynamics in chemically amplified resists
    Kozawa, T
    Yamamoto, H
    Nakano, A
    Saeki, A
    Okamoto, K
    Tagawa, S
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2004, 17 (03) : 449 - 452
  • [30] Mechanistic studies of chemically amplified resists
    Hinsberg, W
    Wallraff, G
    Houle, F
    Morrison, M
    Frommer, J
    Beyers, R
    Hutchinson, J
    ORGANIC THIN FILMS: STRUCTURE AND APPLICATIONS, 1998, 695 : 344 - 359
12345