Research on the color principle of TiN films prepared by magnetron sputtering process

被引：0
|
作者：
College of Mechanical and Electric Engineering, Agricultural University of Hebei, Baoding, China [1 ]
机构：
来源：
J. Chem. Pharm. Res. | / 3卷 / 392-395期
关键词：
Magnetron sputtering;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] POSITION DEPENDENCES IN PLANAR MAGNETRON SPUTTERING OF TIN FILMS
    NEIDHARDT, A
    REINHOLD, U
    SCHROETER, E
    WUTTKE, W
    THIN SOLID FILMS, 1989, 173 (01) : 109 - 127
  • [42] Growth of indium tin oxides films by magnetron sputtering
    Chang, Tianhai
    Sun, Kai
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2009, 29 (03): : 324 - 327
  • [43] REACTIVE MAGNETRON SPUTTERING OF TIN - ANALYSIS OF THE DEPOSITION PROCESS
    DANROC, J
    AUBERT, A
    GILLET, R
    SURFACE & COATINGS TECHNOLOGY, 1987, 33 (1-4): : 83 - 90
  • [44] Effects of Sputtering Power on PtOx Films Prepared by Reactive Magnetron Sputtering
    Kang, Wenbo
    Zhu, Dongmei
    Huang, Zhibin
    Zhou, Wancheng
    Luo, Fa
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (06) : 3848 - 3852
  • [45] Corrosion properties of ZrN films on the aluminium alloy surface prepared by magnetron sputtering process
    Wang, Huiqiang
    Xing, Yanqiu
    Sun, Weilian
    Sun, Bo
    Journal of Chemical and Pharmaceutical Research, 2014, 6 (01) : 346 - 350
  • [46] Process investigation of a-Si:H thin films prepared by DC magnetron sputtering
    Liu, Chunling
    Wang, Chunwu
    Yao, Yanping
    Zhang, Jing
    Qiao, Zhongliang
    Huang, Bo
    Wang, Yuxia
    Bo, Baoxue
    LASERS IN MATERIAL PROCESSING AND MANUFACTURING III, 2008, 6825
  • [47] Aluminum nitride films prepared by reactive magnetron sputtering
    Muhl, S
    Zapien, JA
    Mendez, JM
    Andrade, E
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (15) : 2147 - 2155
  • [48] Hard nanocomposite films prepared by reactive magnetron sputtering
    Musil, J
    NANOSTRUCTURED THIN FILMS AND NANODISPERSION STRENGTHENED COATINGS, 2004, 155 : 43 - 56
  • [49] LABX THIN-FILMS PREPARED BY MAGNETRON SPUTTERING
    KINBARA, A
    NAKANO, T
    KOBAYASHI, A
    BABA, S
    KAJIWARA, T
    APPLIED SURFACE SCIENCE, 1993, 70-1 (1 -4 pt B) : 742 - 745
  • [50] Properties of ITO films prepared by rf magnetron sputtering
    El Akkad, F.
    Punnoose, A.
    Prabu, G.
    Applied Physics A: Materials Science and Processing, 2000, 71 (02): : 157 - 160
12345