Research on the color principle of TiN films prepared by magnetron sputtering process

被引:0
|
作者
College of Mechanical and Electric Engineering, Agricultural University of Hebei, Baoding, China [1 ]
机构
来源
J. Chem. Pharm. Res. | / 3卷 / 392-395期
关键词
Magnetron sputtering;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Properties of TiN films on aluminium alloy surface prepared by magnetron sputtering process
    Xing, Y.-Q. (jdjw@hebau.cdu.cn), 2013, Editorial Office of Transactions of Materials, 18 Xueqing Road, Beijing, 100083, China (34):
  • [2] Kinetic properties of TiN thin films prepared by reactive magnetron sputtering
    Solovan, M. N.
    Brus, V. V.
    Maryanchuk, P. D.
    Kovalyuk, T. T.
    Rappich, J.
    Gluba, M.
    PHYSICS OF THE SOLID STATE, 2013, 55 (11) : 2234 - 2238
  • [3] Kinetic properties of TiN thin films prepared by reactive magnetron sputtering
    M. N. Solovan
    V. V. Brus
    P. D. Maryanchuk
    T. T. Kovalyuk
    J. Rappich
    M. Gluba
    Physics of the Solid State, 2013, 55 : 2234 - 2238
  • [4] Hard TiN2 dinitride films prepared by magnetron sputtering
    Musil, Jindrich
    Jaros, Martin
    Kos, Simon
    Cerstvy, Radomir
    Haviar, Stanislav
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2018, 36 (04):
  • [5] ADHESION OF THIN TIN FILMS PREPARED BY REACTIVE DC MAGNETRON SPUTTERING
    MUSIL, J
    POULEK, V
    DUSEK, V
    CZECHOSLOVAK JOURNAL OF PHYSICS, 1984, 34 (06) : 597 - 600
  • [6] Scattering mechanism of transparent conducting tin oxide films prepared by magnetron sputtering
    Kim, I. H.
    Ko, J. H.
    Kim, D.
    Lee, K. S.
    Lee, T. S.
    Jeong, J. -h.
    Cheong, B.
    Baik, Y-J
    Kim, W. M.
    THIN SOLID FILMS, 2006, 515 (04) : 2475 - 2480
  • [7] Optical, structural and electrical properties of tin oxide films prepared by magnetron sputtering
    Karapatnitski, IA
    Mit', KA
    Mukhamedshina, DM
    Beisenkhanov, NB
    SURFACE & COATINGS TECHNOLOGY, 2002, 151 : 76 - 81
  • [8] Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering
    Lu, Guiyun
    Yu, Lihua
    Ju, Hongbo
    Zuo, Bin
    Xu, Junhua
    SURFACE ENGINEERING, 2020, 36 (02) : 192 - 198
  • [9] The structural and electrochemical properties of tin oxide films prepared by RF magnetron sputtering
    Cai, Minzhen
    Song, Jie
    Zhang, Liangtang
    Wu, Qihui
    Wu, Suntao
    THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE, 2008, 6984
  • [10] Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
    Dhanaraj, R.
    Mohamed, S. B.
    Kamruddin, M.
    Kaviyarasu, K.
    Manojkumar, P. A.
    MATERIALS TODAY-PROCEEDINGS, 2021, 36 : 146 - 149