Effect of pH slurries on chemical mechanical polishing for magnesia-alumina spinel

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作者：
School of Mechanical and Power Engineering, Henan Polytechnic University, Jiaozuo [1 ]
454003, China
不详 [2 ]
453003, China
不详 [3 ]
100013, China
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来源：
Hongwai yu Jiguang Gongcheng Infrared Laser Eng. | 1600年
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Compilation and indexing terms; Copyright 2024 Elsevier Inc;
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摘要：
Alkaline slurry - Chemical mechanical polishing(CMP) - Magnesia alumina spinels - Material removal rate - pH value - Polishing slurries - Rotational speed - Ultraprecision machining
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