Investigation on thick silicon dioxide films evaporation by electron beam evaporation

被引：0
|
作者：
Wu, Xiao-Ming [1 ]
机构：
[1] Dept. of Precision Instrum., Tsinghua Univ., Univ. Stuttgart, Beijing 100084, China
来源：
Guangdianzi Jiguang/Journal of Optoelectronics Laser | 2001年 / 12卷 / 06期
关键词：
Electron beam evaporation - Refractive index;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
收藏
页码：569 / 571
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