X-ray photoelectron spectroscopy study of the role of nitrogen in FeSiAl(N) reactive sputtered films

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作者：
Snyder, J.E. [1 ,2 ,3 ]
Anderegg, J.W. [4 ]
机构：
[1] Metal and Ceramic Sciences Program, Ames Laboratory, Ames, IA 50011, United States
[2] Materials Science and Engineering Department, Iowa State University, Ames, IA 50011, United States
[3] Microelectronics Research Center, Iowa State University, Ames, IA 50011, United States
[4] Ames Laboratory, Ames, IA 50011, United States
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| 1600年 / American Institute of Physics Inc.卷 / 91期
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