Study of critical dimensions of printable phase defects using an extreme ultraviolet microscope

被引:0
|
作者
Kamaji, Yoshito [1 ,3 ]
Takase, Kei [1 ,3 ]
Yoshizumi, Takahiro [1 ,3 ]
Sugiyama, Takashi [2 ]
Uno, Toshiyuki [2 ]
Watanabe, Takeo [1 ,3 ]
Kinoshita, Hiroo [1 ,3 ]
机构
[1] Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan
[2] Asahi Glass Co., Ltd., R and D Center, Yokohama 221-8755, Japan
[3] JST, CREST, Yonbancho, Chiyoda Tokyo 102-0081, Japan
关键词
Compendex;
D O I
10.1143/jjap.48.06fa07
中图分类号
学科分类号
摘要
Defects
引用
收藏
页码:071 / 06
相关论文
共 50 条
  • [11] Resolution enhancement of extreme ultraviolet microscope using an extreme ultraviolet beam splitter
    Osugi, Masafumi
    Tanaka, Kazuumi
    Sakaya, Noriyuki
    Hamamoto, Kazuhiro
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) : 4872 - 4877
  • [12] Phase defect characterization on an extreme-ultraviolet blank mask using microcoherent extreme-ultraviolet scatterometry microscope
    Harada, Tetsuo
    Tanaka, Yusuke
    Watanabe, Takeo
    Kinoshita, Hiroo
    Usui, Youichi
    Amano, Tsuyoshi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (06):
  • [13] Evaluation of extreme-ultraviolet lithography mask absorber pattern on multilayer phase defect using extreme-ultraviolet microscope
    Hamamoto, K.
    Sakaya, N.
    Hosoya, M.
    Kureishi, M.
    Ohkubo, R.
    Shoki, T.
    Nagarekawa, O.
    Kishimoto, J.
    Watanabe, T.
    Kinoshita, H.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (04): : 1938 - 1942
  • [14] Mask defect inspection using an extreme ultraviolet microscope
    Hamamoto, K
    Tanaka, Y
    Lee, SY
    Hosokawa, N
    Sakaya, N
    Hosoya, M
    Shoki, T
    Watanabe, T
    Kinoshita, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (06): : 2852 - 2855
  • [15] Phase imaging results of phase defect using micro-coherent extreme ultraviolet scatterometry microscope
    Harada, Tetsuo
    Hashimoto, Hiraku
    Amano, Tsuyoshi
    Kinoshita, Hiroo
    Watanabe, Takeo
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2016, 15 (02):
  • [16] Minimum critical defects in extreme-ultraviolet lithography masks
    Lin, Y
    Bokor, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2467 - 2470
  • [17] Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
    Bahrenberg, Lukas
    Herbert, Stefan
    Tempeler, Jenny
    Maryasov, Aleksey
    Hofmann, Oskar
    Danylyuk, Serhiy
    Lebert, Rainer
    Loosen, Peter
    Juschkin, Larissa
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI, 2015, 9422
  • [18] Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU
    Harada, Tetsuo
    Nakasuji, Masato
    Tada, Masaki
    Nagata, Yutaka
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [19] Defect Characterization of an Extreme-Ultraviolet Mask Using a Coherent Extreme-Ultraviolet Scatterometry Microscope
    Harada, Tetsuo
    Nakasuji, Masato
    Tokimasa, Akifumi
    Watanabe, Takeo
    Usui, Youichi
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (06)
  • [20] Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask
    Cheng Wei
    Li Sikun
    Wang Xiangzhao
    ACTA OPTICA SINICA, 2023, 43 (01)