Study of critical dimensions of printable phase defects using an extreme ultraviolet microscope

被引:0
|
作者
Kamaji, Yoshito [1 ,3 ]
Takase, Kei [1 ,3 ]
Yoshizumi, Takahiro [1 ,3 ]
Sugiyama, Takashi [2 ]
Uno, Toshiyuki [2 ]
Watanabe, Takeo [1 ,3 ]
Kinoshita, Hiroo [1 ,3 ]
机构
[1] Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan
[2] Asahi Glass Co., Ltd., R and D Center, Yokohama 221-8755, Japan
[3] JST, CREST, Yonbancho, Chiyoda Tokyo 102-0081, Japan
关键词
Compendex;
D O I
10.1143/jjap.48.06fa07
中图分类号
学科分类号
摘要
Defects
引用
收藏
页码:071 / 06
相关论文
共 50 条
  • [1] Study of Critical Dimensions of Printable Phase Defects Using an Extreme Ultraviolet Microscope
    Kamaji, Yoshito
    Takase, Kei
    Yoshizumi, Takahiro
    Sugiyama, Takashi
    Uno, Toshiyuki
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (06)
  • [2] Study on Critical Dimension of Printable Phase Defects Using an Extreme Ultraviolet Microscope: II. Definition of Printable Threshold Region for Hole-Pit Programmed Defects
    Kamaji, Yoshito
    Uno, Toshiyuki
    Takase, Kei
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (12)
  • [3] Study on critical dimension of printable phase defects using an EUV microscope
    Kinoshita, H.
    Yoshizumi, T.
    Osugi, M.
    Kishimoto, J.
    Sugiyama, T.
    Uno, T.
    Watanabe, T.
    MICROELECTRONIC ENGINEERING, 2009, 86 (4-6) : 505 - 508
  • [4] Observation of Phase defect on Extreme Ultraviolet Mask Using an Extreme Ultraviolet Microscope
    Amano, Tsuyoshi
    Terasawa, Tsuneo
    Watanabe, Hidehiro
    Toyoda, Mitsunori
    Harada, Tetsuo
    Watanabe, Takeo
    Kinoshita, Hiroo
    EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY V, 2014, 9048
  • [5] Observation of phase defect on extreme ultraviolet mask using an extreme ultraviolet microscope
    Amano, Tsuyoshi
    Terasawa, Tsuneo
    Watanabe, Hidehiro
    Toyoda, Mitsunori
    Harada, Tetsuo
    Watanabe, Takeo
    Kinoshita, Hiroo
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (02):
  • [6] Phase defect observation using extreme ultraviolet microscope
    Hamamoto, Kazuhiro
    Tanaka, Yuzuru
    Yoshizumi, Takahiro
    Hosokawa, Nobuyuki
    Sakaya, Noriyuki
    Hosoya, Morio
    Shoki, Tsutomu
    Watanabe, Takeo
    Kinoshita, Hiroo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (6 B): : 5378 - 5382
  • [7] Phase defect observation using extreme ultraviolet microscope
    Hamamoto, Kazuhiro
    Tanaka, Yuzuru
    Yoshizumi, Takahiro
    Hosokawa, Nobuyuki
    Sakaya, Noriyuki
    Hosoya, Morio
    Shoki, Tsutomu
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5378 - 5382
  • [8] Characterization of small phase defects using a micro-coherent extreme ultraviolet scatterometry microscope
    Tanaka, Yusuke
    Harada, Tetsuo
    Amano, Tsuyoshi
    Usui, Youichi
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2014, 53 (06)
  • [9] Phase Imaging of Extreme-Ultraviolet Mask Using Coherent Extreme-Ultraviolet Scatterometry Microscope
    Harada, Tetsuo
    Nakasuji, Masato
    Nagata, Yutaka
    Watanabe, Takeo
    Kinoshita, Hiroo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (06)
  • [10] Extreme Ultraviolet Mask Defect Observation Using an Extreme Ultraviolet Microscope
    Amano, Tsuyoshi
    Terasawa, Tsuneo
    Watanabe, Hidehiro
    Toyoda, Mitsunori
    Harada, Tetsuo
    Watanabe, Takeo
    Kinoshita, Hiroo
    PHOTOMASK TECHNOLOGY 2013, 2013, 8880