Electrical properties of amorphous Rh oxide thin films prepared by reactive sputtering

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[1] Abe, Yoshio
[2] Kato, Kiyohiko
[3] Kawamura, Midori
[4] Sasaki, Katsutaka
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Abe, Yoshio | 1600年 / JJAP, Tokyo, Japan卷 / 39期
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