Laser damage precursors in fused silica and mitigation process

被引：1

作者：

Ye, Xin ^{[1
]}

Huang, Jin ^{[1
]}

Wang, Fengrui ^{[1
]}

Cheng, Qiang ^{[1
]}

Liu, Hongjie ^{[1
]}

Zhou, Xinda ^{[1
]}

Sun, Laixi ^{[1
]}

Zhang, Zhen ^{[1
]}

Jiang, Xiaodong ^{[1
]}

Zheng, Wanguo ^{[1
]}

机构：

[1] Research Center of Laser Fusion, CAEP, Mianyang 621900, China

来源：

Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams | 2013年 / 25卷 / 12期

关键词：

Laser damage - Optical materials;

D O I：

10.3788/HPLPB20132512.3220

中图分类号：

学科分类号：

摘要：

The laser damage precursors in fused silica were systematically isolated and identified. The paper shows laser damage micrographs from different precursors which are formed during fabrication. Conventionally polished and subsequently scratched fused silica plates were treated by submerging in various HF-based etchants (HF, or NH4F and HF at various ratios and concentrations) under different process conditions. With the optimized etch process, laser damage resistance increased dramatically; the average threshold fluence for damage initiation for fused silica increased from 4.8 to 11.0 J/cm2.

引用

页码：3220 / 3224

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