Fabrication and developments of nano-gap electrode using self-assembled molecular lithography

被引:0
|
作者
Nishino, Takayuki [1 ,2 ,4 ]
Negishi, Ryota [3 ]
Ishibashi, Koji [1 ,2 ]
机构
[1] Advanced Device Laboratory, RIKEN Advanced Science Institute, 2-1 Hirosawa, Wako, Saitama 351-0198, Japan
[2] Graduate school of advanced Integration Science, Chiba University, Chiba 263-8522, Japan
[3] Department of Applied Physics, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
[4] Planning and Development Section, Sanwa. Co., 362-1 Iiduka, Kumagaya, Saitama 360-0231, Japan
关键词
Electrodes - Contacts (fluid mechanics) - Nanoparticles - Fabrication;
D O I
10.3131/jvsj2.55.333
中图分类号
学科分类号
摘要
Recently, the research of low dimensional nano-structure with nanogap electrode has been intensively studied. In this paper, we describe the fabrication of nanogap electrodes using self-assemble lithography which has advantages of high precision, high yields, and high productivity on the fabrication. Next, single electron transistors (SETs), which consist of Nb nanogap electrode, single molecule of p-xylylenediamine, and Au nano-particle, are shown. Especially, the demonstration of these SETs is attributed to the good connection between Nb nanogap and p-xylylenediamine. Therefore, we introduce the analysis of nano-contacts between nanogap electrode and nano-materials.
引用
收藏
页码:333 / 340
相关论文
共 50 条
  • [31] Self-assembled molecular pattern by chemical lithography and interfacial chemical reactions
    He, Qiang
    Tian, Ying
    Kueller, Alexander
    Grunze, Michael
    Goelzhaeuser, Armin
    Li, Junbai
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2006, 6 (06) : 1838 - 1841
  • [32] Nano-fabrication of organosilane self-assembled monolayers: effects of proximity gap and irradiation time on photoreactivity and lamination
    Furukawa, Takeshi
    Takai, Osamu
    MEASUREMENT SCIENCE AND TECHNOLOGY, 2006, 17 (06) : 1247 - 1253
  • [33] Nanofabrication of self-assembled monolayers using scanning probe lithography
    Liu, GY
    Xu, S
    Qian, YL
    ACCOUNTS OF CHEMICAL RESEARCH, 2000, 33 (07) : 457 - 466
  • [34] Fabrication of MEMS structure with nano-gap using photo-assisted electrochemical etching
    Kim, DH
    Kim, HC
    Chun, K
    MEMS 2005 Miami: Technical Digest, 2005, : 540 - 543
  • [35] Using probe lithography and self-assembled monolayers to fabricate prototype molecular electronics circuits.
    Carroll, RL
    Gorman, C
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2001, 221 : U323 - U323
  • [36] Micro/nano pattern fabrication using ultrafast laser surface modification and self-assembled monolayers
    Chanz, WS
    Huh, KS
    Cho, SH
    Kim, JG
    Whang, KH
    MEMS 2006: 19TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2006, : 322 - 325
  • [37] Parallel Fabrication of Self-Assembled Nanogaps for Molecular Electronic Devices
    Eklof-Osterberg, Johnas
    Gschneidtner, Tina
    Tebikachew, Behabitu
    Lara-Avila, Samuel
    Moth-Poulsen, Kasper
    SMALL, 2018, 14 (50)
  • [38] Fabrication of Nanostructured Surfaces Using Self-Assembled Monolayers
    Bernhard Basnar
    Martin Madera
    Gernot Friedbacher
    Thomas Vallant
    Ulrich Mayer
    Helmuth Hoffmann
    Microchimica Acta, 2000, 133 : 325 - 329
  • [39] SHOCK-PROTECTION OF NANO-GAP CAPACITIVE MEMS ACCELEROMETERS USING SLOPED ELECTRODE DESIGN
    Jeong, Yaesuk
    Foster, Michael
    Chae, Junghun
    Serrano, Diego E.
    Ayazi, Farrokh
    30TH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS (MEMS 2017), 2017, : 1150 - 1153
  • [40] Fabrication of nanostructured surfaces using self-assembled monolayers
    Basnar, B
    Madera, M
    Friedbacher, G
    Vallant, T
    Mayer, U
    Hoffmann, H
    MIKROCHIMICA ACTA, 2000, 133 (1-4) : 325 - 329