Compact low-half-wave-voltage thin film lithium niobate electro-optic phase modulator fabricated by photolithography-assisted chemo-mechanical etching (PLACE)

被引：0

作者：

Gao, Lang ^{[1
,2
,3
]}

Liang, Youting ^{[4
]}

Chen, Jinming ^{[4
]}

Yu, Jianping ^{[4
]}

Qi, Jia ^{[4
]}

Song, Lvbin ^{[4
]}

Liu, Jian ^{[4
]}

Liu, Zhaoxiang ^{[4
]}

Fang, Zhiwei ^{[4
]}

Qi, Hongxin ^{[4
,5
]}

Cheng, Ya ^{[1
,2
,4
,5
,6
,7
,8
,9
,10
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech SIOM, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech SIOM, CAS Ctr Excellence Ultraintense Laser Sci, Shanghai 201800, Peoples R China

[3] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

[4] East China Normal Univ, Sch Phys & Elect Sci, Extreme Optoelectromech Lab XXL, Shanghai 200241, Peoples R China

[5] East China Normal Univ, State Key Lab Precis Spect, Shanghai 200062, Peoples R China

[6] Shanxi Univ, Collaborat Innovat Ctr Extreme Opt, Taiyuan 030006, Shanxi, Peoples R China

[7] Shandong Normal Univ, Collaborat Innovat Ctr Light Manipulat & Applicat, Jinan 250358, Peoples R China

[8] Hefei Natl Lab, Hefei 230088, Peoples R China

[9] East China Normal Univ, Joint Res Ctr Light Manipulat Sci & Photon Integra, Shanghai 200241, Peoples R China

[10] East China Normal Univ, Shandong Normal Univ, Shanghai 200241, Peoples R China

来源：

OPTICS LETTERS | 2024年 / 49卷 / 20期

基金：

中国国家自然科学基金;

关键词：

Photolithography;

D O I：

10.1364/OL.538158

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a compact dual-arm thin-film lithium niobate (TFLN) electro-optic phase modulator fabricated using the photolithography-assisted chemo-mechanical etching (PLACE) technique. The design of the device doubles the modulation amount compared to single-arm modulators while maintaining the same chip length. Achieving a half wave voltage of approximately 3 V, the device outperforms conventional single-arm phase modulators. Furthermore, the phase modulator exhibits low sensitivity to optical wavelengths in the range of 1510-1600 nm and offers a low insertion loss of 2.8 dB. The capability to generate multiple sideband signals for optical frequency comb applications is also demonstrated, producing 29 sideband signals at input microwave power of 2 W. (c) 2024 Optica Publishing Group. All rights, including for text and data mining (TDM), Artificial Intelligence (AI) training, and similar technologies, are reserved.

引用

页码：5783 / 5786

页数：4

共 31 条

[1] Thin-film lithium niobate electro-optic isolator fabricated by photolithography assisted chemo-mechanical etching
Gao, Lang
Liang, Youting
Song, Lvbin
Yin, Difeng
Qi, Jia
Chen, Jinming
Liu, Zhaoxiang
Yu, Jianping
Liu, Jian
Zhang, Haisu
Fang, Zhiwei
Qi, Hongxin
Cheng, Ya
OPTICS LETTERS, 2024, 49 (03) : 614 - 617
[2] Monolithically integrated electro-optic modulator fabricated on lithium niobate on insulator by photolithography assisted chemo-mechanical etching
Liang, Youting
Zhou, Junxia
Yin, Difeng
Zheng, Yong
Qi, Hongxin
Wang, Min
Fang, Zhiwei
Wu, Rongbo
Cheng, Ya
JOURNAL OF PHYSICS-PHOTONICS, 2021, 3 (03):
[3] Monolithic Yb3+-doped thin film lithium niobate microring laser fabricated by photolithography-assisted chemo-mechanical etching technology
Ma, Y. U.
Zhou, J. U. N. X. I. A.
Fang, Z. H. I. W. E. I.
Zhou, Y. U. A. N.
Huang, T. I. N. G.
Zhu, Y. I. R. A. N.
Wang, Z. H. E.
Liu, J. I. A. N.
Liu, Z. H. A. O. X. I. A. N. G.
Wu, R. O. N. G. B. O.
Wang, M. I. N.
Zhang, HAIsU
Cheng, Y. A.
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2023, 40 (05) : D1 - D4
[4] High-Production-Rate Fabrication of Low-Loss Lithium Niobate Electro-Optic Modulators Using Photolithography Assisted Chemo-Mechanical Etching (PLACE)
Wu, Rongbo
Gao, Lang
Liang, Youting
Zheng, Yong
Zhou, Junxia
Qi, Hongxin
Yin, Difeng
Wang, Min
Fang, Zhiwei
Cheng, Ya
MICROMACHINES, 2022, 13 (03)
[5] Low half-wave-voltage and high-bandwidth thin-film lithium niobate electro-optic modulator
Zhao, Guanbao
Xiao, Jinbiao
JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY, 2025,
[6] Thin film lithium niobate electro-optic modulator with reduced half-wave voltage length product through design
Li, Ye
Hong, Lihong
Chen, Baoqin
Li, Zhi-yuan
APPLIED OPTICS, 2024, 63 (31) : 8257 - 8262
[7] Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching
Li, Chuntao
Guan, Jianglin
Lin, Jintian
Gao, Renhong
Wang, Min
Qiao, Lingling
Deng, Li
Cheng, Ya
OPTICS EXPRESS, 2023, 31 (19) : 31556 - 31562
[8] Monolithic single-frequency microring laser on an erbium-doped thin film lithium niobate fabricated by a photolithography assisted chemo-mechanical etching
Liang Y.
Zhou J.
Wu R.
Fang Z.
Liu Z.
Yu S.
Yin D.
Zhang H.
Zhou Y.
Liu J.
Wang Z.
Wang M.
Cheng Y.
Optics Continuum, 2022, 1 (05): : 1193 - 1201
[9] Thin Film Lithium Niobate Electro-optic Modulator Based on a Slow Wave Structure
Liu, Xuecheng
Xiong, Bing
Sun, Changzheng
Hao, Zhibiao
Wang, Lai
Wang, Jian
Han, Yanjun
Li, Hongtao
Yu, Jiadong
Luo, Yi
2020 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR), 2020,
[10] High-index-contrast single-mode optical waveguides fabricated on lithium niobate by photolithography assisted chemo-mechanical etching (PLACE)
Zhang, Jianhao
Wu, Rongbo
Wang, Min
Fang, Zhiwei
Lin, Jintian
Zhou, Junxia
Gao, Renhong
Chu, Wei
Cheng, Ya
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (08)

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